Lantiq – Process Characterization in 40nm and Level Shifter Optimization in 65nm (RF Design)
Session 3.1, G. Golla, Lantiq
Session 3.1, G. Golla, Lantiq
Session 2.3, R. Stewart, STMicroelectronics
Session 2.2, G. H. Oh, Altera
Session 1.4, P. Estrada, Berkeley Design Automation
Session 7.1, A. Bänisch, University Erlangen
Session 6.2, F. Adduci, STMicroelectronics
Session 5.1, C. Roma, MunEDA