Fast Hierarchical & High Sigma Monte Carlo
TBD
HLMC Shanghai Huali Microelectronics Corporation at MUGM MunEDA User Group Meeting
“With MunEDA tools SPT and DNO we could successfully migrate and optimize for high gain our designs
from 55nm to 40nm and simultaneously verify for required PVT corner and statistical variation yield analysis.”
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next design project
Use MunEDA tools and support to speed up efficiency,
quality and outcome of your next circuit design project